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Impact of post-annealing temperature on optical and surface properties of tellurium doped ZnO nanocrystalline films

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Authors: Department of Electronics, DNCVPS Shirish Madhukarrao Chaudhari College, Jalgaon, Maharashtra, India, A.U. Sonawan, B.K. Sonawane, Department of Electronics, J.D.M.V.P.Co-Op. Samaj’s Arts, Commerce and Science College, Jalgaon, Maharashtra, India

Year

2022

Paper ID

13591

Status

Peer-reviewed

Abstract Read

~2 min

Abstract Words

107

Citations

6

Abstract

Investigated in this work is the effect of post-annealing temperature on ZnO nanocrystalline thin films doped with 5 at.% tellurium. The spin coating method was used to deposit films on the microscopic glass substrates. XRD, AFM, and UV-spectro-photometry were used to characterize the films structure, surface roughness and optical properties. The XRD spectra showed that the nanocrystalline films are of monocrystalline nature. AFM has confirmed the nanocrystalline character of tellurium-doped ZnO. The transmission of exposed films has been decreased with the increase of annealing temperature. The average transmission of all the films has been revealed to be higher than 80%. The optical band gap varies slightly with post-annealing temperature.

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  • Investigated in this work is the effect of post-annealing temperature on ZnO nanocrystalline thin films doped with 5 at.% tellurium.

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References & Citation Signals

[1] DOI https://doi.org/10.15407/spqeo25.04.398 [2] Publisher https://doi.org/10.15407/spqeo25.04.398

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External citation index: OpenAlex citation signal • updated 2026-06-14 03:57:56

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