Comparative assessment of germanium-based spin-qubit modalities: donor, acceptor, gate-defined hole, and gate-defined electron platforms

High-purity germanium (Ge) has re-emerged as a versatile semiconductor platform for spin-based quantum information processing because it combines mature materials processing, access to spin-free isotopes, high mobilities, small effective masses, and strong but engineerable spin--orbit coupling. However, "Ge qubits" are not a single technology. Donor spin qubits, acceptor spin qubits, gate-defined hole spin qubits, and gate-defined electron spin qubits exploit different parts of the Ge band structure and therefore make distinct trade-offs among coherence, controllability, fabrication complexity, and scalability. Here we compare these four Ge-based spin-qubit modalities on a common physical and architectural footing. We review the shared Ge materials physics, including isotopic purification, the multivalley L-point conduction band, the spin-3/2 valence band, heavy-hole/light-hole mixing, strain, interfaces, disorder, and phonons. We also introduce a common framework for estimating phononic-crystal-modified T₁ using a calibrated reference relaxation rate, a geometry-dependent strain-density-of-states suppression factor, and parasitic relaxation channels. The comparison shows that gate-defined Ge hole-spin qubits currently offer the strongest combination of all-electrical control, demonstrated multiqubit operation, and scalability. Donor, acceptor, and gate-defined electron qubits remain important complementary directions for memory, hybrid, and exploratory architectures. Overall, Ge supports a diverse qubit ecosystem, with gate-defined hole-spin qubits presently providing the clearest path toward scalable Ge-based quantum processors.