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Trapped Ion Quantum Computing
A scalable platform for nanometer-scale quantum confinement
arXiv
Authors: Christina M. Spaegele, Mehdi Rezaee, Thomas Werkmeister, Soon Wei Daniel Lim, Kailyn Vaillancourt, Joon-Suh Park, Paul Chevalier, Ido Kaminer, Philip Kim, Federico Capasso, Michele Tamagnone
Year
2026
Paper ID
49025
Status
Preprint
Abstract Read
~2 min
Abstract Words
168
Citations
N/A
Abstract
Overcoming the limitations of current nanofabrication techniques to achieve nanoscale feature sizes is essential for achieving new regimes of light-matter interactions at extreme frequencies and length scales. Here, we demonstrate a scalable nanofabrication platform capable of producing in-plane feature sizes down to 1.75 nm, pushing the boundaries of current top-down nanofabrication techniques. Using precise thickness control of atomic layer deposition (ALD) and employing widely spaced oxide nanofins, we transform conventional ALD into a surface structuring method that produces nanolaminates with sub-10 nm periodicities over large areas. The resulting nanostructures can be used as a one-dimensional gate array to control charge carriers in two-dimensional materials. As an initial demonstration, we integrate the platform with graphene and perform electron transport measurements. In the presence of the gate array enabled by the nanolaminate, we observe satellite Dirac peaks consistent with band-structure modulation, suggestive of quantum-confinement effects. Our platform paves the way for exploring previously inaccessible regimes of nanoscale light-matter interactions, holding significant promise for applications in short wavelength optics, electronics, and polaritonics.
Why This Paper Matters
- This paper contributes to the Trapped-Ion Quantum Computing research area in the Quantum Articles archive.
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- Overcoming the limitations of current nanofabrication techniques to achieve nanoscale feature sizes is essential for achieving new regimes of light-matter interactions at...
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