Lab-scale momentum microscopy for micro-ARPES studies of van der Waals materials

Abstract We report on the development of a lab-scale momentum microscopy facility for the real space and momentum space imaging of micron-sized areas on van der Waals materials. Using reference samples of spatial patterns and single crystal, we show that the system can attain spatial, energy, and momentum resolutions of 80 nm, 70 meV, and 0.02 Å −1 , respectively. These performance specifications are exemplified by the identification and band dispersion mapping of multilayer WS 2 micro flakes down to few µ m sized region. The results demonstrate the system’s effectiveness for lab-scale micro-angle-resolved photoemission spectroscopy studies, enabling rapid systematic electronic characterization of van der Waals materials as feedback for growth optimization or quality screening of materials prior to their integration into optoelectronic or quantum devices.