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Quantum Device Fabrication Process Engineering

Fabrication effects on Niobium oxidation and surface contamination in Niobium-metal bilayers using X-ray photoelectron spectroscopy

arXiv
Authors: Tathagata Banerjee, Maciej W. Olszewski, Valla Fatemi

Year

2026

Paper ID

3119

Status

Preprint

Abstract Read

~2 min

Abstract Words

101

Citations

0

Abstract

Superconducting resonators and qubits are limited by dielectric losses from surface oxides. Surface oxides are mitigated through various strategies such as the addition of a metal capping layer, surface passivation, and acid processing. In this study, we demonstrate the use of X-ray photoelectron spectroscopy (XPS) as a rapid characterization tool to study the effectiveness cap layers for niobium for further device fabrication. We non-destructively evaluate 17 capping layers to characterize their ability to prevent oxygen diffusion, and the effects of standard fabrication processes - annealing, resist stripping, and acid cleaning. We downselect for resilient capping layers and test their microwave resonator performance.

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  • This paper contributes to the Quantum Device Fabrication & Process Engineering research area in the Quantum Articles archive.
  • It adds a 2026 reference point for readers tracking recent quantum research.
  • Superconducting resonators and qubits are limited by dielectric losses from surface oxides.

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