Quick Navigation

Topics

Spin Qubits Silicon Quantum Computing Quantum Chemistry Quantum Device Fabrication Process Engineering

Impacts of the top antireflection films on the performance of blue micro-LEDs.

PubMed
Authors: ShouQiang L, Deng Y, Zhang G, Huang Y, Zhang D, Zhuang J, Liu B, Lu G, He J, Liu Z, Chen Z, Wu T

Year

2026

Paper ID

28371

Status

Peer-reviewed

Abstract Read

~2 min

Abstract Words

203

Citations

N/A

Abstract

In this work, we have fabricated the blue micro-LEDs with 0, 8, 10 and 12 periods of SiO₂/TiO₂ AR films by using the technology of atomic layer deposition. In addition, by measuring the properties of these AR films and the optoelectronic performance of these micro-LEDs, the impacts of these AR films for these micro-LEDs have been analysed. For the poorer thermal dissipation characteristics of SiO₂ and TiO₂ than that of air, there would be lower resistance in the micro-LEDs with more periods of AR films under high current injected condition. In addition, the optical properties of these AR films result in the higher external quantum efficiency in the micro-LEDs with more periods of AR films, and the light distribution of micro-LEDs with 0, 2, 4, 6, 8, 10, 12 and 14 periods of AR films has been analysed by using the FDTD software. Moreover, the junction-temperature rise and the stability of these micro-LEDs has been investigated by using the 1000 hour accelerating aging test under (85°C/85% humidity) under the injection current of 40 mA, these results indicate that AR films has excellent reliability under 85°C and 85% humidity conditions, and the deposition of AR films would result in the poorer thermal behaviour in micro-LEDs. We hope these findings could give reference for the fabrication of high-performance micro-LEDs.

Why This Paper Matters

  • This paper contributes to the Quantum Chemistry research area in the Quantum Articles archive.
  • It adds a 2026 reference point for readers tracking recent quantum research.
  • In this work, we have fabricated the blue micro-LEDs with 0, 8, 10 and 12 periods of SiO₂/TiO₂ AR films by using the technology of atomic layer deposition.

Paper Tools

Become a member to use research tools

Sign in to open papers, visit source links, share, cite, compare, copy DOI links, request category corrections, and build your reading list.

Publisher Share Cite This Paper Copy URL Compare Copy DOI Add to Reading List Category Correction Request

References & Citation Signals

Local Citation Graph (Related-Paper Links)

Current Paper #28371 #69596 Comprehensive pKa Data Augmenta... #69589 An integrated ultrahigh vacuum ... #69558 Analyzing Initialization Strate... #69553 VQE as Initial State Preparatio...

External citation index: OpenAlex citation signal

Community Reactions

Quick sentiment from readers on this paper.

Score: 0
Likes: 0 Dislikes: 0

Sign in to react to this paper.

Discussion & Reviews (Moderated)

Average Rating: 0.0 / 5 (0 ratings)

No written reviews yet.